Tag: hafnium

Halogen-free plasma technique achieves atomic-level etching of hafnium oxide for next-gen semiconductors

A facile anisotropic atomic-layer etching course of for HfO2 movies at room temperature with out utilizing halogen-based chemical

By saad

Freestanding hafnium zirconium oxide membranes can enable advanced 2D transistors

Fabrication and characterization of ferroelectric freestanding HZO membranes. Credit score: Nature Electronics (2025). DOI: 10.1038/s41928-025-01398-y To additional cut

By saad